Published December 2011 | Version v1
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Characterization and Dielectric Properties of LaMnO3 Thin Films by Spin Coating Method

Creators

Description

This paper presents LaMnO3 nanostructured thin films were deposited on silicon substrate by using Single Wafer Spin Processor. LaMnO3 powder was firstly prepared by pyrolysis method. The structural, morphology and thermal properties of LMO powder was examined by XRD, SEM and TG-DTA. The films obtained after spin coating have been annealed at 500 C and 600 C for 1h. Morphology, and structural properties of fabricated LaMnO3 thin films were investigated by SEM and XRD analysis. The objective of this research is to explore the structure, dielectric properties and processing of thin films that contain nanoscale embedded hard particles.

Availability note (English)

Also published in ICSE 2011: The Third International Conference on Science and Engineering

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Additional details

Publishing Information

Imprint Place
Yangon (Myanmar)
Imprint Pagination
5 p.
Report number
INIS-MM--155

Conference

Title
3. International Conference on Science and Engineering
Acronym
ICSE 2011
Dates
1-2 Dec 2011
Place
Yangon (Myanmar)

INIS

Country of Publication
Myanmar
Country of Input or Organization
Myanmar
INIS RN
43099504
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
DIELECTRIC PROPERTIES; SPIN; SUBSTRATES; THIN FILMS; X-RAY DIFFRACTION
Descriptors DEC
ANGULAR MOMENTUM; COHERENT SCATTERING; DIFFRACTION; ELECTRICAL PROPERTIES; FILMS; PARTICLE PROPERTIES; PHYSICAL PROPERTIES; SCATTERING