Published December 2010 | Version v1
Journal article

Surface electronic structure of Ti-covered W(1 1 1) by photofield emission

  • 1. Institute of Experimental Physics, University of WrocLaw, plac Maksa Borna 9, 50-204 WrocLaw (Poland)

Description

Photofield emission (PFE) measurements are employed to examine modifications of the surface electronic structure of the tungsten (1 1 1) facet upon deposition of thin films (1-3 monolayers) of titanium. With the help of DFT simulations, the observed PFE features are interpreted as adsorbate-induced resonance states with energies just below the Fermi level, localized predominantly at the exposed surface atoms. Comparison between the computed surface DOS distributions and the measured PFE spectra is also used to verify various possible arrangements of the Ti adatoms, supporting the DFT-favored model of Ti growth in registry with the W(1 1 1) substrate until a full physical overlayer of the adsorbate is completed. -- Research highlights: →Surface DOS modifications of Ti/W(1 1 1) revealed by photofield emission. →Strong adsorbate-induced resonance states observed at Ti/W(1 1 1) near Fermi level. →Ti growth in registry with W(1 1 1) substrate confirmed up to full physical overlayer.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2010.09.006

Additional details

Identifiers

DOI
10.1016/j.ultramic.2010.09.006;
PII
S0304-3991(10)00238-X;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
111
Journal Issue
1
Journal Page Range
p. 5-10
ISSN
0304-3991
CODEN
ULTRD6

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.