Three-dimensional effects for two-dimensional samples in plasma immersion ion implantation

Plasma immersion ion implantation is a fast method for ion implantation into complex-shaped three-dimensional objects as the ions are accelerated from the receding plasma sheath edge towards the substrate during the negative high-voltage pulses. Except for the region near the edges, homogeneous implantation can be obtained for the surface of flat samples. Here, it is shown that a much larger absolute dose and a much larger dose variation is observed on the back side of rectangular stainless steel samples - resulting in highly localized corrosion - due to the interference of the supporting rod connected to the high voltage-feed through