Influences of oxide material on high density plasma production using capacitively coupled discharge

Production of capacitively coupled high density plasma with electron density of 101-1011 cm-3 was realized by the addition of secondary electrons emission from electrode using some oxide materials. The breakdown voltage has also been investigated at various oxide materials such as copper oxide (CuO), magnesium oxide(MgO), titanium oxide (TiO2) and strontium titanium oxide (SrTiO3). The breakdown voltage for MgO and SrTiO3 materials was lower than that for CuO and TiO2 materials. The plasma density for MgO and SrTiO3 materials was found to increase drastically with increasing applied voltage V RF, while for CuO and TiO2 materials, it increased to be roughly proportional to V RF