Published December 1, 2015
| Version v1
Journal article
Study of Nb/NbxSi1−x/Nb Josephson junction arrays
Creators
- 1. National Institute of Metrology, Beijing 100029 (China)
Description
Owing to the adjustable characteristics and superior etching properties of co-sputtered NbxSi1−x film, we are trying to fabricate Nb/NbxSi1−x/Nb Josephson junction arrays for voltage standard. It is important to find the suitable NbxSi1−x barrier for the junctions. Josephson junctions with different barrier content are fabricated. Current–voltage characteristics are measured and analyzed. It is demonstrated in this paper that critical current can be adjusted by using different barrier content and thickness. Shapiro steps of five hundred junctions in series are observed. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/24/12/127402Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 24
- Journal Issue
- 12
- Journal Page Range
- [4 p.]
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47096998
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- CRITICAL CURRENT; ELECTRIC POTENTIAL; ETCHING; JOSEPHSON JUNCTIONS; NIOBIUM; NIOBIUM SILICIDES; SPUTTERING; THICKNESS; THIN FILMS
- Descriptors DEC
- CURRENTS; DIMENSIONS; ELECTRIC CURRENTS; ELEMENTS; FILMS; METALS; NIOBIUM COMPOUNDS; REFRACTORY METAL COMPOUNDS; REFRACTORY METALS; SILICIDES; SILICON COMPOUNDS; SUPERCONDUCTING JUNCTIONS; SURFACE FINISHING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; TUNNEL JUNCTIONS