Published July 15, 2013
| Version v1
Journal article
Tailoring of SiC nanoprecipitates formed in Si
Creators
- 1. Horia Hulubei National Institute for Physics and Nuclear Engineering, P.O. Box MG-6, 077125 Magurele (Romania)
- 2. CEA, DEN, Service de Recherches de Métallurgie Physique, Laboratoire JANNUS, F-91191 Gif-sur-Yvette (France)
- 3. Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, UMR8609, Bât. 108, 91405 Orsay (France)
- 4. CEA, INSTN, UEPTN, Laboratoire JANNUS, F-91191 Gif-sur-Yvette (France)
- 5. CEA, DEN, Service de Recherches de Métallurgie Physique, F-91191 Gif-sur-Yvette (France)
- 6. Ecole Polytechnique, Laboratoire des Solides Irradiés, CEA/DSM/IRAMIS-CNRS, 91128 Palaiseau Cedex (France)
Description
The SiC synthesis through single-beam of C+, and simultaneous-dual-beam of C+ and Si+ ion implantations into a Si substrate heated at 550 °C has been studied by means of three complementary analytical techniques: nuclear reaction analysis (NRA), Raman, and transmission electron microscopy (TEM). It is shown that a broad distribution of SiC nanoprecipitates is directly formed after simultaneous-dual-beam (520-keV C+ and 890-keV Si+) and single-beam (520-keV C+) ion implantations. Their shape appear as spherical (average size ∼4–5 nm) and they are in epitaxial relationship with the silicon matrix
Availability note (English)
Available from http://dx.doi.org/10.1016/j.nimb.2012.12.089Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2012.12.089;
- PII
- S0168-583X(13)00111-0;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 307
- Journal Page Range
- p. 165-170
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 18. international conference on ion beam modifications of materials
- Acronym
- IBMM2012
- Dates
- 2-7 Sep 2012
- Place
- Qingdao (China)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45065251
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAMS; CARBON IONS; DISTRIBUTION; EPITAXY; ION IMPLANTATION; KEV RANGE 100-1000; NUCLEAR REACTION ANALYSIS; PRECIPITATION; SHAPE; SILICON CARBIDES; SILICON IONS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; CHARGED PARTICLES; CHEMICAL ANALYSIS; CRYSTAL GROWTH METHODS; ELECTRON MICROSCOPY; ENERGY RANGE; IONS; KEV RANGE; MICROSCOPY; NONDESTRUCTIVE ANALYSIS; SEPARATION PROCESSES; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.