Super TOF secondary ion mass spectroscopy using very highly charged primary ions up to Th70+

The LLNL Electron Beam Ion Trap (EBIT) has made low emittance beams of slow highly charged ions available for ion-solid interaction studies. Such interactions feature the dominance of electronic over collisional effects, and the shock waves generated by the ionized target atoms can desorb large numbers of large molecular species from the surface. This paper presents the first systematic study of the sputtering process due to the incidence of slow very highly charged ions; Th70+ ions are extracted from EBIT at 7 keV*q and directed onto thin SiO2 films on Si. Results suggest secondary ion yields of up to 25 per incident ion for Th70+ (secondary ion yield is increased over that for singly or moderately charged ions). Correlations of the negative, positive, and negative cluster ion yields show promise for application of highly charged ion induced sputtering for enhanced sensitivity and quantitative (absolute) SIMS analysis of deep submicron scale surface layers and polymeric and biomolecular material analysis