Published 1973
| Version v1
Book
Application of characteristic secondary ion mass spectra to a depth analysis of copper oxide on copper
- 1. Philips Research Labs., Eindhoven, Netherlands
Description
no abstract available
Additional details
Publishing Information
- Publisher
- Gordon and Breach, Science Publishers, Inc.
- Imprint Place
- New York
- Imprint Title
- Ion surface interaction, sputtering, and related phenomena
- Imprint Pagination
- p. 305-309.
Conference
- Title
- International conference of ion surface interaction, sputtering and related phenomena.
- Dates
- 24 Sep 1972.
- Place
- Munich, F.R. Germany.
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 6195293
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON IONS; CHEMICAL ANALYSIS; COPPER; COPPER OXIDES; DEPTH; FILMS; ION BEAMS; MASS SPECTROSCOPY; SECONDARY EMISSION
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHARGED PARTICLES; COPPER COMPOUNDS; DIMENSIONS; ELEMENTS; EMISSION; IONS; METALS; OXIDES; OXYGEN COMPOUNDS; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Notes
- Imprint:See CONF-7209125--.