Published 1996
| Version v1
Miscellaneous
UO2 etching by fluorine containing gas plasma for DUPIC process
- 1. Hanyang Univ., Seoul (Korea, Republic of)
Description
Research on the dry etching of UO2 by using fluorine containing gas plasma is carried out for DUPIC (Direct Use of PWR spent fuel Into Candu) process which is taken into consideration for potential future fuel cycle in Korea. CF4/O2 gas mixture is chosen for the reactant gas and the etching rates of UO2 by the gas plasma are investigated as functions of substrate temperature, plasma gas pressure, CF4/O2 ratio, and plasma power. It is tentatively found that the etching rate can reach 1000 monolayers/min. and the optimum CF4/O2 ratio is around 4:1. (author)
Additional details
Publishing Information
- Imprint Title
- Proceedings of the 2nd Japan-Korea seminar on advanced reactors
- Imprint Pagination
- 299 p.
- Journal Page Range
- p. 163-165.
- Report number
- INIS-JP--072
Conference
- Title
- 2. Japan-Korea seminar on advanced reactors.
- Dates
- 15-17 Oct 1996.
- Place
- Tokyo (Japan).
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 28054577
- Subject category
- S11: NUCLEAR FUEL CYCLE AND FUEL MATERIALS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BINARY MIXTURES; CANDU TYPE REACTORS; CARBON TETRAFLUORIDE; CONCENTRATION RATIO; ETCHING; OXYGEN; PLASMA; PRESSURE DEPENDENCE; PWR TYPE REACTORS; REPUBLIC OF KOREA; SPENT FUELS; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0400-1000 K; URANIUM DIOXIDE; URANIUM RECYCLE
- Descriptors DEC
- ACTINIDE COMPOUNDS; ASIA; CHALCOGENIDES; DEVELOPING COUNTRIES; DISPERSIONS; ELEMENTS; ENERGY SOURCES; ENRICHED URANIUM REACTORS; FUEL CYCLE; FUELS; HEAVY WATER MODERATED REACTORS; MATERIALS; MIXTURES; NONMETALS; NUCLEAR FUELS; ORGANIC COMPOUNDS; ORGANIC FLUORINE COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; POWER REACTORS; PRESSURE TUBE REACTORS; REACTOR MATERIALS; REACTORS; TEMPERATURE RANGE; THERMAL REACTORS; URANIUM COMPOUNDS; URANIUM OXIDES; WATER COOLED REACTORS; WATER MODERATED REACTORS