In situ study through electrical resistance of growth rate of trifluoroacetate-based solution-derived YBa₂Cu₃O₇ films

In this work, we have studied by means of in situ electrical measurements the nucleation, growth and sintering stages of epitaxial YBa₂Cu₃O_6+δ (YBCO) superconducting thin films prepared using a chemical solution deposition approach based on metal-organic trifluoroacetate-based (TFA) precursors. Single crystal substrates (LaAlO₃ and CeO₂/YSZ) were used in this study. Analysis of isothermal time dependences, at different temperatures, of in situ electrical resistance of films allowed to evidence that the growth rate G is strongly temperature dependent, i.e. G is enhanced by a factor ∼15 when going from 700 to 810 °C. Additionally, we demonstrate that adding Ag-TFA in the solution may enhance the growth rate by as much as 50%, as compared to pure YBCO, thus confirming previous assessments of the strong influence of Ag doping on YBCO film growth and microstructure. In situ electrical resistance measurements show as well that an incubation time exists and we infer the origin of its temperature dependence. Finally, a thermodynamic analysis allows proposing a single equation for the growth rate of YBCO films integrating all the relevant processing parameters. Our analysis has validated the solid-gas reaction-diffusion model describing the growth of YBCO films from TFA precursors and thus enlarges the knowledge required to enhance the control of the microstructure and superconducting properties of solution-derived YBCO films. (paper)