Multilayer optics for x-ray analysis: design - fabrication - application

Full text: The use of multilayer optics induced a decisive extension of opportunities in laboratory based X-ray analysis. With the growing number of different applications, more and more dedicated X-ray optics are required, optimized for the spectral range they are intended to be used for. Both the characteristic of the used X-ray source and the design of the multilayer optics finally define the performance of the conditioned incident beam for the application. In any case, qualified spacer and absorber materials have to be selected for the deposition of the multilayer in respect to the designated X-ray wavelength. X-ray optical devices based on uniform multilayers have the advantage of a wide acceptance angle but show chromatic aberrations. This effect can be avoided by synthesizing a multilayer with a lateral thickness gradient. The gradient ensures that any beam of a certain wavelength emitted from an infinite narrow X-ray source impinging the multilayer optics fulfills the Bragg condition. Three different types of curvature of laterally graded multilayer mirrors are used for X-ray analysis experiments: parabolic, elliptic and planar, which result in parallel, focusing and divergent beam conditions, respectively. Furthermore, the X-ray beam characteristics: intensity, monochromasy, divergence, beam width and brilliance can be additionally conditioned by combining one multilayer optics with either a different optic and/or with a crystal monochromator. The deposition of nanometer-multilayers, used as X-ray optical components, result in extraordinary requirements of the deposition process concerning precision, reproducibility and long term stability. Across a stack of more than 150 individual layers with thicknesses in the range between 1 to 10 nm, a variation of single layer thickness considerably lower than σD = 0.1 nm and an interface roughness below σR = 0.25 nm have to be achieved. Thickness homogeneity Δd/d < 1% and lateral thickness gradients Δd/Δx ∼ 10-8 have to be guaranteed across macroscopic substrate dimensions. Magnetron sputtering and e-beam evaporation are well established deposition techniques to fabricate X-ray optical multilayers. For specific layer material combinations and tailored thickness profiles, Pulsed Laser Deposition (PLD) has become an interesting alternative to these predominant technologies. As a result of the accuracy achieved with PLD, gradient multilayers of different material combinations can be deposited both on flat and on pre-curved substrates. For several years, Ni/C- Goebel-Mirrors are well established in X-ray diffraction using Cu Kα-radiation. Intensities of more then 109 cps together with a low beam divergence Δφ < 0.02 deg and a superior suppression of Cu Kβ-radiation l(Cu Kα1) : l(Cu Kβ) > 106 are realized with the Twin Goebel-Mirror arrangement (TGM). The TGM arrangement is also available for Mo Kα-radiation. A combination of a graded multilayer mirror for Mo Kα-radiation and a Germanium channel cut monochromator is capable of providing monochromatic Mo Kα1 - radiation. There are further applications of multilayer optics in the high energy range for synchrotron, medical and astrophysical investigations. In surface analyses like AES and SIMS, these nanometer-multilayers can also be used to study depth resolution effects in depth profiling analysis. Copyright (2002) Australian X-ray Analytical Association Inc