Refinement performance and mechanism of an Al-50Si alloy
Creators
- 1. Key Laboratory of Liquid Structure and Heredity of Materials, Ministry of Education, Shandong University, 73 Jingshi Road, Jinan 250061 (China)
Description
The microstructure and melt structure of primary silicon particles in an Al-50%Si (wt.%) alloy have been investigated by optical microscopy, scanning electron microscopy, electron probe micro-analysis and a high temperature X-ray diffractometer. The results show that the Al-50Si alloy can be effectively refined by a newly developed Si-20P master alloy, and the melting temperature is crucial to the refinement process. The minimal overheating degree ΔTmin (ΔTmin is the difference between the minimal overheating temperature Tmin and the liquidus temperature TL) for good refinement is about 260 deg. C. Primary silicon particles can be refined after adding 0.2 wt.% phosphorus amount at sufficient temperature, and their average size transforms from 2-4 mm to about 30 μm. The X-ray diffraction data of the Al-50Si melt demonstrate that structural change occurs when the melting temperature varies from 1100 deg. C to 1300 deg. C. Additionally, the relationship between the refinement mechanism and the melt structure is discussed
Availability note (English)
Available from http://dx.doi.org/10.1016/j.matchar.2008.01.020Additional details
Identifiers
- DOI
- 10.1016/j.matchar.2008.01.020;
- PII
- S1044-5803(08)00060-0;
Publishing Information
- Journal Title
- Materials Characterization
- Journal Volume
- 59
- Journal Issue
- 11
- Journal Page Range
- p. 1559-1563
- ISSN
- 1044-5803
- CODEN
- MACHEX
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40018129
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ELECTRON MICROPROBE ANALYSIS; MELTING POINTS; MICROSTRUCTURE; OPTICAL MICROSCOPY; PARTICLES; PERFORMANCE; PHOSPHORUS ADDITIONS; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON ALLOYS; TEMPERATURE RANGE 1000-4000 K; X-RAY DIFFRACTION; X-RAY DIFFRACTOMETERS
- Descriptors DEC
- ALLOYS; CHEMICAL ANALYSIS; COHERENT SCATTERING; DIFFRACTION; DIFFRACTOMETERS; ELECTRON MICROSCOPY; ELEMENTS; MEASURING INSTRUMENTS; MICROANALYSIS; MICROSCOPY; NONDESTRUCTIVE ANALYSIS; PHYSICAL PROPERTIES; SCATTERING; SEMIMETALS; TEMPERATURE RANGE; THERMODYNAMIC PROPERTIES; TRANSITION TEMPERATURE
Optional Information
- Copyright
- Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.