Published January 1977 | Version v1
Report Restricted

Ion beam studies. Part 5 - the computer simulation of composite ion implantation profiles

Creators

Description

The computer simulation of composite ion implantation profiles produced by continuous energy programming and by discrete multiple dose doping is described. It is shown that precise matching of the computed profile to various uniform and power-law distributions can be achieved. (author)

Availability note (English)

MF available from INIS under the Report Number; Also available from H.M. Stationery Office, price Pound1.00.

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Additional details

Publishing Information

ISBN
0 70 580437 2
Imprint Pagination
16 p.
Report number
AERE-R--8656

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
8323048
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Is Lead record
Yes
Descriptors DEI
COMPUTER CODES; COMPUTERS; DEPTH; ENERGY DEPENDENCE; ION BEAMS; ION IMPLANTATION; RADIATION DOSES; RANGE; SIMULATION; SPATIAL DISTRIBUTION; VARIATIONS
Descriptors DEC
BEAMS; DIMENSIONS; DISTRIBUTION