Published February 2008
| Version v1
Journal article
Determination of Thickness and Optical Constants of ZnO Thin Films Prepared by Filtered Cathode Vacuum Arc Deposition
Creators
- 1. State Key Laboratory of Optoelectronic Materials and Technologies, and Department of Physics, School of Physics and Engineering, Sun Yat-Sen University, Guangzhou 510275 (China)
- 2. Experiment Center, Guangdong University of Technology, Guangzhou 510090 (China)
- 3. School of Physical Science, Shenzhen University, Shenzhen 518060 (China)
Description
ZnO thin films are prepared on glass substrates by filtered cathode vacuum arc (FCVA) deposition technique. A new method is demonstrated to extract the refractive index, thickness and optical band gap of ZnO thin films from the transmission spectrum alone. The refractive index is calculated from the extremes of the interference fingers. The transmission spectrum is divided into two terms, non-interference term and interference effect term. The thickness of thin films is calculated by simulating the interference term, and the non-interference term is used to calculate optical band gap with the gained thickness. The results are compared with measurements by using an ellipsometry and a scanning electron microscope
Availability note (English)
Available from http://dx.doi.org/10.1088/0256-307X/25/2/106Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics Letters
- Journal Volume
- 25
- Journal Issue
- 2
- Journal Page Range
- p. 743-746
- ISSN
- 0256-307X
- CODEN
- CPLEEU
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44112646
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CATHODES; ELECTRODEPOSITION; ELLIPSOMETRY; GLASS; INTERFERENCE; OPTICAL PROPERTIES; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THICKNESS; THIN FILMS; TRANSMISSION; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; DEPOSITION; DIMENSIONS; ELECTRODES; ELECTROLYSIS; ELECTRON MICROSCOPY; FILMS; LYSIS; MEASURING METHODS; MICROSCOPY; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SURFACE COATING; ZINC COMPOUNDS