Published February 2008 | Version v1
Journal article

Determination of Thickness and Optical Constants of ZnO Thin Films Prepared by Filtered Cathode Vacuum Arc Deposition

  • 1. State Key Laboratory of Optoelectronic Materials and Technologies, and Department of Physics, School of Physics and Engineering, Sun Yat-Sen University, Guangzhou 510275 (China)
  • 2. Experiment Center, Guangdong University of Technology, Guangzhou 510090 (China)
  • 3. School of Physical Science, Shenzhen University, Shenzhen 518060 (China)

Description

ZnO thin films are prepared on glass substrates by filtered cathode vacuum arc (FCVA) deposition technique. A new method is demonstrated to extract the refractive index, thickness and optical band gap of ZnO thin films from the transmission spectrum alone. The refractive index is calculated from the extremes of the interference fingers. The transmission spectrum is divided into two terms, non-interference term and interference effect term. The thickness of thin films is calculated by simulating the interference term, and the non-interference term is used to calculate optical band gap with the gained thickness. The results are compared with measurements by using an ellipsometry and a scanning electron microscope

Availability note (English)

Available from http://dx.doi.org/10.1088/0256-307X/25/2/106

Additional details

Identifiers

Publishing Information

Journal Title
Chinese Physics Letters
Journal Volume
25
Journal Issue
2
Journal Page Range
p. 743-746
ISSN
0256-307X
CODEN
CPLEEU