Published December 2012 | Version v1
Journal article

Nanoparticle movement: Plasmonic forces and physical constraints

  • 1. Institute for Advanced Materials, Devices, and Nanotechnology, Rutgers University, Piscataway, NJ 08854 (United States)
  • 2. Donostia International Physics Center, "DIPC", Donostia-San Sebastian, 20018 (Spain)
  • 3. Instituto de Física, Universidad Nacional Autónoma de México, 01000 México D.F. (Mexico)
  • 4. Universidad del Pais Vasco (UPV)/EHU, and Centro de Física de Materiales CSIC-UPV/EHU, Donostia-San Sebastian 20018 (Spain)

Description

Nanoparticle structures observed in aberration-corrected electron microscopes exhibit many types of behavior, some of which are dominated by intrinsic conditions, unrelated to the microscope environment. Some behaviors are clearly driven by the electron beam, however, and the question arises as to whether these are similar to intrinsic mechanisms, useful for understanding nanoscale behavior, or whether they should be regarded as unwanted modification of as-built specimens. We have studied a particular kind of beam–specimen interaction – plasmon dielectric forces caused by the electric fields imposed by a passing swift electron – identifying four types of forced motion, including both attractive and repulsive forces on single nanoparticles, and coalescent and non-coalescent forces in groups of two or more nanoparticles. We suggest that these forces might be useful for deliberate electron beam guided movement of nanoparticles. -- Highlights: ► We investigate the interaction of metal nanoparticles with a high energy electron beam. ► We find forces ranging from 0.1 to 50 pN forces between the metal particles and the beam. ► At moderate distances, dielectric forces are usually small and attractive. ► At sub-Nm distances the forces become repulsive, pushing nanoparticles away from the electron beam. ► While the repulsive behavior is predicted by electromagnetic theory, the detailed origin of the behavior is not yet understood.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2012.05.004

Additional details

Identifiers

DOI
10.1016/j.ultramic.2012.05.004;
PII
S0304-3991(12)00106-4;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
123
Journal Page Range
p. 50-58
ISSN
0304-3991
CODEN
ULTRD6

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45028036
Subject category
S36: MATERIALS SCIENCE; S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
DIELECTRIC MATERIALS; ELECTRIC FIELDS; ELECTRON BEAMS; ELECTRON MICROSCOPY; METALS; NANOSTRUCTURES; PARTICLES; PLASMONS; VAN DER WAALS FORCES
Descriptors DEC
BEAMS; ELEMENTS; LEPTON BEAMS; MATERIALS; MICROSCOPY; PARTICLE BEAMS; QUASI PARTICLES

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.