Published September 18, 2006 | Version v1
Journal article

Structure of HfO2 films epitaxially grown on GaAs (001)

  • 1. Research Division, National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan (China)
  • 2. Department of Physics, National Tsing Hua University, Hsinchu 30013, Taiwan (China)
  • 3. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China)

Description

High-quality HfO2 films of technologically important thickness ranging from 1.8 to 17 nm have been grown epitaxially on GaAs (001) by molecular beam epitaxy. Thorough structural and morphological investigations were carried out by x-ray scattering and high-resolution transmission electron microscopy. The films exhibit an atomically sharp interface with the substrate and are of a monoclinic phase with predominant (001)-plane epitaxy between the HfO2 films and GaAs, in spite of a large lattice mismatch of >8.5%

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
89
Journal Issue
12
Journal Page Range
p. 122907-122907.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2006 American Institute of Physics