Published July 2016 | Version v1
Journal article Metadata-only

Precursor dependent nucleation and growth of ruthenium films during chemical vapor deposition

Creators

  • 1. McKetta Department of Chemical Engineering, University of Texas at Austin, 200 E Dean Keeton St. Stop C0400, Austin, Texas 78712 (United States)

Description

Nucleation and film growth characteristics are reported during chemical vapor deposition of Ru on SiO2 using triruthenium dodecacarbonyl [Ru3(CO)12] and ruthenium bis(di-t-butylacetamidinate) dicarbonyl [Ru(tBu-Me-amd)2(CO)2]. Films grown from Ru3(CO)12 follow the three dimensional (3D) Volmer–Weber growth mode. In contrast, films grown from Ru(tBu-Me-amd)2(CO)2 follow the pseudo-layer-by-layer growth mode with two dimensional wetting layer islands forming before 3D particle growth is observed on the islands. A relationship between free isolated hydroxyl [(Si-OH)i] group density and Ru nucleation density is found for Ru3(CO)12 and is associated with (Si-OH)i acting as the reaction sites for activation of Ru3(CO)12 and in turn generating an adjustable adatom concentration. Carbon monoxide and ammonia addition to the gas phase during film growth from Ru(tBu-Me-amd)2(CO)2 lead to smoother films by inducing surface reconstructions during the 3D phase of pseudo-layer-by-layer growth; these gases also lead to films with lower resistivity and lower crystalline character.

Additional details

Identifiers

DOI
10.1116/1.4953882;

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Journal Volume
34
Journal Issue
4
Journal Page Range
p. 041514-041514.7
ISSN
0734-2101
CODEN
JVTAD6

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
48037435
Subject category
S42: ENGINEERING;
Descriptors DEI
AMMONIA; CARBON MONOXIDE; CHEMICAL VAPOR DEPOSITION; CONCENTRATION RATIO; DENSITY; FILMS; HYDROXIDES; LAYERS; NUCLEATION; RUTHENIUM; SILICA; SILICON OXIDES; SURFACES; THREE-DIMENSIONAL CALCULATIONS; TWO-DIMENSIONAL CALCULATIONS; VAPORS
Descriptors DEC
CARBON COMPOUNDS; CARBON OXIDES; CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; DIMENSIONLESS NUMBERS; ELEMENTS; FLUIDS; GASES; HYDRIDES; HYDROGEN COMPOUNDS; METALS; MINERALS; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; PLATINUM METALS; REFRACTORY METALS; SILICON COMPOUNDS; SURFACE COATING; TRANSITION ELEMENTS

Optional Information

Notes
(c) 2016 American Vacuum Society