Published September 1986
| Version v1
Journal article
Sputtering of the dilute Si(Co, Ta) alloy with 20-80 keV Ar+ ions
- 1. Academia Sinica, Shanghai (China). Shanghai Inst. of Nuclear Research
- 2. Academia Sinica, Shanghai (China). Shanghai Inst. of Metallurgy
Description
The study of alloy and compound sputtering is very important to applications of material sputtering phenomena and to the theory of atomic collision. The surface layer compositional change of sample under sputtering is an interesting one of many sputtering phenomena. In order to observe this phenomenon and to study its characteristic, the ternary alloy system Si(Co, Ta) was selected. The samples were sputtered individually with 20-80 keV Ar+ ions. How the surface layer compositional change depended on the energy of Ar+ ions was studied
Additional details
Publishing Information
- Journal Title
- Nucl. Tech.
- Journal Issue
- no.9
- Series
- Nucl. Tech.
- ISSN
- 0253-3219
- CODEN
- NUTED
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 18096515
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANNEALING; ARGON IONS; AUGER ELECTRON SPECTROSCOPY; COBALT ALLOYS; DISTRIBUTION; ENERGY DEPENDENCE; KEV RANGE 10-100; RADIATION SCATTERING ANALYSIS; RUTHERFORD SCATTERING; SILICON ALLOYS; SPUTTERING; SURFACE PROPERTIES; TANTALUM ALLOYS; TERNARY ALLOY SYSTEMS
- Descriptors DEC
- ALLOY SYSTEMS; ALLOYS; CHARGED PARTICLES; CHEMICAL ANALYSIS; ELASTIC SCATTERING; ELECTRON SPECTROSCOPY; ENERGY RANGE; HEAT TREATMENTS; IONS; KEV RANGE; NONDESTRUCTIVE ANALYSIS; SCATTERING; SPECTROSCOPY