High gain-bandwidth product Ge/Si tunneling avalanche photodiode with high-frequency tunneling effect
- 1. State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)
Description
This study presents a theoretical investigation of a novel Ge/Si tunneling avalanche photodiode (TAPD) with an ultra-thin barrier layer between the absorption and p+ contact layer. A high-frequency tunneling effect is introduced into the structure of the barrier layer to increase the high-frequency response when frequency is larger than 0.1 GHz, and the −3 dB bandwidth of the device increases evidently. The results demonstrate that the avalanche gain and −3 dB bandwidth of the TAPD can be influenced by the thickness and bandgap of the barrier layer. When the barrier thickness is 2 nm and the bandgap is 4.5 eV, the avalanche gain loss is negligible and the gain-bandwidth product of the TAPD is 286 GHz, which is 18% higher than that of an avalanche photodiode without a barrier layer. The total noise in the TAPD was an order of magnitude smaller than that in APD without barrier layer. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/38/11/114003Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 38
- Journal Issue
- 11
- Journal Page Range
- [5 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51064537
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- GAIN; GHZ RANGE; LAYERS; PHOTODIODES; THICKNESS; TUNNEL EFFECT
- Descriptors DEC
- AMPLIFICATION; DIMENSIONS; FREQUENCY RANGE; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES