Published November 1, 2017 | Version v1
Journal article

High gain-bandwidth product Ge/Si tunneling avalanche photodiode with high-frequency tunneling effect

  • 1. State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

This study presents a theoretical investigation of a novel Ge/Si tunneling avalanche photodiode (TAPD) with an ultra-thin barrier layer between the absorption and p+ contact layer. A high-frequency tunneling effect is introduced into the structure of the barrier layer to increase the high-frequency response when frequency is larger than 0.1 GHz, and the −3 dB bandwidth of the device increases evidently. The results demonstrate that the avalanche gain and −3 dB bandwidth of the TAPD can be influenced by the thickness and bandgap of the barrier layer. When the barrier thickness is 2 nm and the bandgap is 4.5 eV, the avalanche gain loss is negligible and the gain-bandwidth product of the TAPD is 286 GHz, which is 18% higher than that of an avalanche photodiode without a barrier layer. The total noise in the TAPD was an order of magnitude smaller than that in APD without barrier layer. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/38/11/114003

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
38
Journal Issue
11
Journal Page Range
[5 p.]
ISSN
1674-4926

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51064537
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
GAIN; GHZ RANGE; LAYERS; PHOTODIODES; THICKNESS; TUNNEL EFFECT
Descriptors DEC
AMPLIFICATION; DIMENSIONS; FREQUENCY RANGE; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES