Published June 1, 2011 | Version v1
Journal article

Micromachined array-type Mirau interferometer for parallel inspection of MEMS

  • 1. Département MN2S, FEMTO-ST (UMR CNRS 6174), 16 Route de Gray, 25030 Besançon Cedex (France)
  • 2. Fraunhofer IOF, A-Einstein-Str. 7, 07745-Jena (Germany)
  • 3. SINTEF IKT Optical Measurement Systems and Data Analysis, N-7465 Trondheim (Norway)

Description

We present the development of an array type of micromachined Mirau interferometers, operating in the regime of low coherence interferometry (LCI) and adapted for massively parallel inspection of MEMS. The system is a combination of free-space micro-optical technologies and silicon micromachining, based on the vertical assembly of two glass wafers. The probing wafer carries an array of refractive microlenses, diffractive gratings to correct chromatic and spherical aberrations and reference micro-mirrors. The semitransparent beam splitter plate is based on the deposition of a dielectric multilayer, sandwiched between two glass wafers. The interferometer matrix is the key element of a novel inspection system aimed to perform parallel inspection of MEMS. The fabricated demonstrator, including 5 × 5 channels, allows consequently decreasing the measurement time by a factor of 25. In the following, the details of fabrication processes of the micro-optical components and their assembly are described. The feasibility of the LCI is demonstrated for the measurement of a wafer of MEMS sensors

Availability note (English)

Available from http://dx.doi.org/10.1088/0960-1317/21/6/065005

Additional details

Identifiers

DOI
10.1088/0960-1317/21/6/065005;
PII
S0960-1317(11)79739-X;

Publishing Information

Journal Title
Journal of Micromechanics and Microengineering. Structures, Devices and Systems
Journal Volume
21
Journal Issue
6
Journal Page Range
[10 p.]
ISSN
0960-1317
CODEN
JMMIEZ

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47010139
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
BEAMS; DEPOSITION; DIELECTRIC MATERIALS; FABRICATION; GEOMETRICAL ABERRATIONS; GLASS; GRATINGS; INTERFEROMETERS; INTERFEROMETRY; LAYERS; MACHINING; MEMS; MIRRORS; SENSORS; SILICON
Descriptors DEC
ELEMENTS; MATERIALS; MEASURING INSTRUMENTS; SEMIMETALS