Published January 2013
| Version v1
Journal article
Inverse temperature dependence of reverse gate leakage current in AlGaN/GaN HEMT
- 1. Solid State Physics Laboratory, Lucknow Road, Timarpur, Delhi 110054 (India)
- 2. Indian Institute of Technology Delhi, Hauz Khas, New Delhi 110016 (India)
Description
The experimentally observed inverse temperature dependence of the reverse gate leakage current in AlGaN/GaN HEMT is explained using a virtual gate trap-assisted tunneling model. The virtual gate is formed due to the capture of electrons by surface states in the vicinity of actual gate. The increase and decrease in the length of the virtual gate with temperature due to trap kinetics are used to explain this unusual effect. The simulation results have been validated experimentally. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0268-1242/28/1/015026Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductor Science and Technology
- Journal Volume
- 28
- Journal Issue
- 1
- Journal Page Range
- [6 p.]
- ISSN
- 0268-1242
- CODEN
- SSTEET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45014089
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- GALLIUM NITRIDES; LEAKAGE CURRENT; SIMULATION; SURFACES; TEMPERATURE DEPENDENCE; TUNNEL EFFECT
- Descriptors DEC
- CURRENTS; ELECTRIC CURRENTS; GALLIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES