Published January 2013 | Version v1
Journal article

Inverse temperature dependence of reverse gate leakage current in AlGaN/GaN HEMT

  • 1. Solid State Physics Laboratory, Lucknow Road, Timarpur, Delhi 110054 (India)
  • 2. Indian Institute of Technology Delhi, Hauz Khas, New Delhi 110016 (India)

Description

The experimentally observed inverse temperature dependence of the reverse gate leakage current in AlGaN/GaN HEMT is explained using a virtual gate trap-assisted tunneling model. The virtual gate is formed due to the capture of electrons by surface states in the vicinity of actual gate. The increase and decrease in the length of the virtual gate with temperature due to trap kinetics are used to explain this unusual effect. The simulation results have been validated experimentally. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/28/1/015026

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
28
Journal Issue
1
Journal Page Range
[6 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45014089
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
GALLIUM NITRIDES; LEAKAGE CURRENT; SIMULATION; SURFACES; TEMPERATURE DEPENDENCE; TUNNEL EFFECT
Descriptors DEC
CURRENTS; ELECTRIC CURRENTS; GALLIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES