Comprehensive investigations on the influence of gun current of plasma spraying on the properties of silicon carbide films
Creators
- 1. Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047 (Japan)
Description
Polycrystalline silicon carbide films have been prepared by the gas tunnel type plasma spraying method (GTPS). The effect of gun current on microstructure and mechanical properties was investigated. Scanning electron microscopy, X-ray diffraction, energy dispersive spectroscopy, nanoindentation and abrasive wear were used to characterize the structure, thickness, composition and the mechanical properties of SiC films. Microstructural studies revealed that the formation of cubic silicon carbide (C-SiC) at higher gun currents from 120 to 140 A. The SiC films have good-adhesion, dense, smooth and compact morphology. Hardness of SiC films strongly improved from 23 to 31.5 GPa as the gun current increased from 0 to 140 A. SiC films formed at higher gun current exhibits better wear resistance than that deposited at low gun current, mainly due to SiC films become more hard and more dense. The crystalline cubic silicon carbide films with good morphology and mechanical properties have been obtained from the GTPS method, which makes it a suitable material for high-temperature thermoelectric and mechanical applications
Additional details
Identifiers
- DOI
- 10.1016/j.mseb.2006.11.006;
- PII
- S0921-5107(06)00665-9;
Publishing Information
- Journal Title
- Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
- Journal Volume
- 137
- Journal Issue
- 1-3
- Journal Page Range
- p. 131-137
- ISSN
- 0921-5107
- CODEN
- MSBTEK
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38087204
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABRASIVES; COMPACTS; FILMS; HARDNESS; MICROSTRUCTURE; MORPHOLOGY; POLYCRYSTALS; PRESSURE RANGE GIGA PA; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDES; SPRAY COATING; TEMPERATURE RANGE 0400-1000 K; THERMOELECTRIC MATERIALS; THICKNESS; WEAR; WEAR RESISTANCE; X-RAY DIFFRACTION
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; COHERENT SCATTERING; CRYSTALS; DEPOSITION; DIFFRACTION; DIMENSIONS; ELECTRON MICROSCOPY; MATERIALS; MECHANICAL PROPERTIES; MICROSCOPY; PRESSURE RANGE; SCATTERING; SILICON COMPOUNDS; SURFACE COATING; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.