Published December 2005 | Version v1
Journal article

Simulations of dual rf-biased sheaths and ion energy distributions arriving at a dual rf-biased electrode

  • 1. State Key Laboratory of Materials Modification by Laser, Electron, and Ion Beams, Department of Physics, Dalian University of Technology, Dalian 116023 (China)
  • 2. State Key Laboratory of Structural Analysis for Industrial Equipment, Department of Engineering Mechanics, Dalian University of Technology, Dalian 116023 (China)

Description

Spatio-temporal characteristics of collisionless dual rf-biased sheaths and ion energy distributions (IEDs) impinging on a dual rf-biased electrode are studied with a self-consistent one-dimensional hydrodynamic model. The model includes all the time-dependent terms in the ion fluid equations to ensure that it can describe the sheath dynamics over a wide range of frequencies. In addition, an equivalent circuit model is used to self-consistently determine the relationship between the instantaneous sheath thickness and the instantaneous voltage on the dual rf-biased electrode. The numerical results show that, due to dual radiofrequencies being applied to an electrode, the sheath structures and parameters of dual rf-biased sheaths are different from those in the case of single frequency-biased plasma. Multiple peaks appear in the IEDs arriving at the dual rf-biased electrode rather than a bimodal shape as the IEDs are incident onto a single frequency-biased electrode. It is also shown that some parameters such as the bias frequency and power of the lower-frequency source as well as the phase difference between the lower-frequency wave and the higher-frequency wave are crucial for determining the dual rf sheath structure and the shape of IEDs

Additional details

Identifiers

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
12
Journal Issue
12
Journal Page Range
p. 123502-123502.8
ISSN
1070-664X
CODEN
PHPAEN

Optional Information

Notes
(c) 2005 American Institute of Physics