Simulations of dual rf-biased sheaths and ion energy distributions arriving at a dual rf-biased electrode
- 1. State Key Laboratory of Materials Modification by Laser, Electron, and Ion Beams, Department of Physics, Dalian University of Technology, Dalian 116023 (China)
- 2. State Key Laboratory of Structural Analysis for Industrial Equipment, Department of Engineering Mechanics, Dalian University of Technology, Dalian 116023 (China)
Description
Spatio-temporal characteristics of collisionless dual rf-biased sheaths and ion energy distributions (IEDs) impinging on a dual rf-biased electrode are studied with a self-consistent one-dimensional hydrodynamic model. The model includes all the time-dependent terms in the ion fluid equations to ensure that it can describe the sheath dynamics over a wide range of frequencies. In addition, an equivalent circuit model is used to self-consistently determine the relationship between the instantaneous sheath thickness and the instantaneous voltage on the dual rf-biased electrode. The numerical results show that, due to dual radiofrequencies being applied to an electrode, the sheath structures and parameters of dual rf-biased sheaths are different from those in the case of single frequency-biased plasma. Multiple peaks appear in the IEDs arriving at the dual rf-biased electrode rather than a bimodal shape as the IEDs are incident onto a single frequency-biased electrode. It is also shown that some parameters such as the bias frequency and power of the lower-frequency source as well as the phase difference between the lower-frequency wave and the higher-frequency wave are crucial for determining the dual rf sheath structure and the shape of IEDs
Additional details
Identifiers
- DOI
- 10.1063/1.2142247;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 12
- Journal Issue
- 12
- Journal Page Range
- p. 123502-123502.8
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37085626
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ELECTRIC POTENTIAL; ELECTRODES; ENERGY SPECTRA; EQUIVALENT CIRCUITS; IONS; PLASMA; PLASMA FLUID EQUATIONS; PLASMA SHEATH; PLASMA SIMULATION; RADIOWAVE RADIATION; TIME DEPENDENCE
- Descriptors DEC
- BOLTZMANN-VLASOV EQUATION; CHARGED PARTICLES; DIFFERENTIAL EQUATIONS; ELECTROMAGNETIC RADIATION; ELECTRONIC CIRCUITS; EQUATIONS; PARTIAL DIFFERENTIAL EQUATIONS; RADIATIONS; SIMULATION; SPECTRA
Optional Information
- Notes
- (c) 2005 American Institute of Physics