Active glass–polymer superlattice structure for photonic integration
Creators
- 1. Institute for Materials Research, University of Leeds, Leeds, LS2 9JT (United Kingdom)
- 2. School of Electronic and Electrical Engineering, University of Leeds, Leeds, LS2 9JT (United Kingdom)
- 3. Electrical Engineering Division, Department of Engineering, University of Cambridge, Cambridge, CB3 0FA (United Kingdom)
Description
We propose an all-laser processing approach allowing controlled growth of organic–inorganic superlattice structures of rare-earth ion doped tellurium-oxide-based glass and optically transparent polydimethyl siloxane (PDMS) polymer; the purpose of which is to illustrate the structural and thermal compatibility of chemically dissimilar materials at the nanometer scale. Superlattice films with interlayer thicknesses as low as 2 nm were grown using pulsed laser deposition (PLD) at low temperatures (100 °C). Planar waveguides were successfully patterned by femtosecond-laser micro-machining for light propagation and efficient Er3+-ion amplified spontaneous emission (ASE). The proposed approach to achieve polymer–glass integration will allow the fabrication of efficient and durable polymer optical amplifiers and lossless photonic devices. The all-laser processing approach, discussed further in this paper, permits the growth of films of a multitude of chemically complex and dissimilar materials for a range of optical, thermal, mechanical and biological functions, which otherwise are impossible to integrate via conventional materials processing techniques. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/23/22/225302Additional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 23
- Journal Issue
- 22
- Journal Page Range
- [7 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43104590
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- AMPLIFIERS; DOPED MATERIALS; ENERGY BEAM DEPOSITION; ERBIUM IONS; FABRICATION; FILMS; GLASS; LASER RADIATION; LASERS; MACHINING; NANOSTRUCTURES; POLYMERS; PROCESSING; PULSED IRRADIATION; RARE EARTHS; SUPERLATTICES; TELLURIUM OXIDES; TEMPERATURE RANGE 0273-0400 K; WAVEGUIDES
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; DEPOSITION; ELECTROMAGNETIC RADIATION; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; IONS; IRRADIATION; MATERIALS; METALS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SURFACE COATING; TELLURIUM COMPOUNDS; TEMPERATURE RANGE