Published November 29, 2013 | Version v1
Journal article

Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding

  • 1. Graduate School of Information Science and Electrical Engineering, Kyushu University (Japan)
  • 2. Interdisciplinary Graduate School of Engineering Sciences, Kyushu University (Japan)

Description

The effects of a balanced power feeding (BPF) method on a very high frequency hydrogen plasma produced with narrow-gap parallel plate electrodes are studied by 2-dimensional simulation. It was found that the electron density increases inside the electrodes and decreases outside the electrodes. The input power was effectively absorbed into the intermediate region of the electrodes. In addition, the electron density outside the electrodes decreased with increasing the gas pressure, and the electron density inside the electrodes peaked at a certain pressure. The property of the power absorption was improved and the electron temperature decreased for the higher gas pressure in the BPF model. - Highlights: • The effect of balanced power feeding on very high frequency plasma was examined by simulation. • Electron density inside the electrodes increased by the balanced power feeding. • Electron density outside the electrodes decreased significantly. • Suppression effect on electron density was more effective at high gas pressure. • Input power was efficiently absorbed inside the electrodes

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2013.04.054

Additional details

Identifiers

DOI
10.1016/j.tsf.2013.04.054;
PII
S0040-6090(13)00690-1;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
547
Journal Page Range
p. 132-136
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
4. international conference on microelectronics and plasma technology
Acronym
ICMAP 2012
Dates
4-7 Jul 2012
Place
Jeju (Korea, Republic of)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46128446
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION; COMPUTERIZED SIMULATION; ELECTRODES; ELECTRON DENSITY; ELECTRON TEMPERATURE; FEEDING; HYDROGEN; MHZ RANGE; PLASMA; PLASMA PRESSURE; PLASMA PRODUCTION; PLASMA SIMULATION
Descriptors DEC
ELEMENTS; FREQUENCY RANGE; NONMETALS; SIMULATION; SORPTION

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.