Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding
- 1. Graduate School of Information Science and Electrical Engineering, Kyushu University (Japan)
- 2. Interdisciplinary Graduate School of Engineering Sciences, Kyushu University (Japan)
Description
The effects of a balanced power feeding (BPF) method on a very high frequency hydrogen plasma produced with narrow-gap parallel plate electrodes are studied by 2-dimensional simulation. It was found that the electron density increases inside the electrodes and decreases outside the electrodes. The input power was effectively absorbed into the intermediate region of the electrodes. In addition, the electron density outside the electrodes decreased with increasing the gas pressure, and the electron density inside the electrodes peaked at a certain pressure. The property of the power absorption was improved and the electron temperature decreased for the higher gas pressure in the BPF model. - Highlights: • The effect of balanced power feeding on very high frequency plasma was examined by simulation. • Electron density inside the electrodes increased by the balanced power feeding. • Electron density outside the electrodes decreased significantly. • Suppression effect on electron density was more effective at high gas pressure. • Input power was efficiently absorbed inside the electrodes
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2013.04.054Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2013.04.054;
- PII
- S0040-6090(13)00690-1;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 547
- Journal Page Range
- p. 132-136
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 4. international conference on microelectronics and plasma technology
- Acronym
- ICMAP 2012
- Dates
- 4-7 Jul 2012
- Place
- Jeju (Korea, Republic of)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46128446
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION; COMPUTERIZED SIMULATION; ELECTRODES; ELECTRON DENSITY; ELECTRON TEMPERATURE; FEEDING; HYDROGEN; MHZ RANGE; PLASMA; PLASMA PRESSURE; PLASMA PRODUCTION; PLASMA SIMULATION
- Descriptors DEC
- ELEMENTS; FREQUENCY RANGE; NONMETALS; SIMULATION; SORPTION
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.