Published 1996 | Version v1
Miscellaneous Open

The influence of microscopic and macroscopic non-stoichiometry on interfacial planarity during the solid-phase epitaxial growth of amorphized GaAs

  • 1. Australian National Univ., Canberra, ACT (Australia). Dept. of Physics

Description

The influence of microscopic and macroscopic non-stoichiometry on the Solid-Phase Epitaxial Growth of GaAs has been studied. Ion implantation has been employed to produce microscopic non-stoichiometry via Ga and As implants and macroscopic non-stoichiometry via Ga or As implants. In-situ Time Resolved Reflectivity and Transmission Electron Microscopy and ex-situ Rutherford Backscattering Spectroscopy and Channeling have been used to investigate the regrowth of amorphized GaAs layers. As non-stoichiometry shifts from microscopic to macroscopic the interface loses its planar nature and subsequently gets rougher. 7 refs., 3 figs

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Part of:
9th Australian conference on nuclear techniques of analysis. Proceedings

Additional details

Publishing Information

Imprint Place
Lucas Heights (Australia)
Imprint Title
9th Australian conference on nuclear techniques of analysis. Proceedings
Imprint Pagination
186 p.
Journal Page Range
p. 44-46.
Report number
INIS-AU--0003

Conference

Title
9. Australian conference on nuclear techniques of analysis.
Dates
27-29 Nov 1995.
Place
Newcastle, NSW (Australia).

Optional Information