Effect of surface layer etching and ion-dosage on bubble state transition in ion-implanted garnet films
Description
The effect of the ion-implanted surface layer on the relationship between the bubble deflection angle theta and the in-plane field H sub(1p) is investigated. The samples used are either etched a part of the surface layer implanted Ne+ ions of 100 keV to a dosage of 7 x 1013 cm-2 or implanted to various dosages. In the samples implanted to a dosage of 7 x 1013 cm-2, it is found that the effective layer determining the wall structure of the underlying bubble exists in the region between 500 and 800 A deep from the surface. In the sample implanted to as high dosage as 1015 cm-2, theta varies with increasing and then decreasing H sub(1p) gradually rather than abruptly as generally seen. These results are interpreted based on the relevant works on the magnetic properties of the ion-implanted layer and the bubble state transitions. (author)
Additional details
Publishing Information
- Journal Title
- Mem. Fac. Eng., Nagoya Univ.
- Journal Volume
- 32
- Journal Issue
- 1
- Series
- Mem. Fac. Eng., Nagoya Univ.
- Journal Page Range
- 143-157
- ISSN
- 0027-7657
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 13666606
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ATOMIC IONS; BUBBLES; DEPTH; DOPED MATERIALS; ETCHING; FILMS; GARNETS; ION IMPLANTATION; KEV RANGE 10-100; LAYERS; MAGNETIC FIELDS; MAGNETIC PROPERTIES; NEON IONS; SURFACES
- Descriptors DEC
- CHARGED PARTICLES; DIMENSIONS; ENERGY RANGE; IONS; KEV RANGE; MINERALS; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SILICATES; SILICON COMPOUNDS; SURFACE FINISHING