Published June 19, 2019 | Version v1
Journal article

Interface electron transfer and thickness dependent transport characteristics of La0.7Sr0.3VO3 thin films

  • 1. National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering and Jiangsu Key Laboratory for Artificial Functional Materials, Nanjing University, Nanjing, Jiangsu 210093 (China)
  • 2. National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, Anhui 230029 (China)

Description

La0.7Sr0.3VO3 (LSVO) thin films, 5–30 unit cells (u.c.) in thickness, have been epitaxially deposited on (0 0 1) SrTiO3 (STO) single crystal substrates. Although LSVO is metallic in bulk, insulating behavior is observed, from 2 to 390 K, in LSVO films less than 9 u.c. in thickness, while thicker films show a metal-insulator transition with the critical temperature increasing with the decrease of film thickness. X-ray absorption spectra reveal a charge transfer across the LSVO/STO interface for a continuous increase of V valence in LSVO, as well as a decrease of Ti valence in interfacial STO, with the LSVO film thickness increases. The transport characteristics are discussed in terms of enhanced electron localization due to the reduction of film thickness and V 3d band filling induced by the charge transfer. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-648X/ab0f68

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Physics. Condensed Matter
Journal Volume
31
Journal Issue
24
Journal Page Range
[6 p.]
ISSN
0953-8984
CODEN
JCOMEL