Thermochromic properties of vanadium oxide films prepared by dc reactive magnetron sputtering
- 1. Centro de Fisica e Departamento de Fisica, Universidade do Minho, 4710 Braga (Portugal)
- 2. College of Physics, JiLin University, 2519 JieFangDaLu Road, 130021 ChangChun (China)
- 3. Departamento de Fisica, Instituto Superior de Engenharia do Porto, Rua de Sao Tome, 4200 Porto (Portugal)
- 4. Dept. Ciencia dos Materiais, CENIMAT, Faculdade de Ciencias e Tecnologia da Universidade Nova de Lisboa, PT-2829-516 Caparica (Portugal)
Description
A transparent vanadium oxide film has been one of the most studied electrochromic (EC) and Thermochromic (TC) materials. Vanadium oxide films were deposited at different substrate temperatures up to 400 deg. C and different ratios of the oxygen partial pressure (PO2). SEM, AFM and X-ray diffraction's results show detail structure data of the films. IR mode assignments of the films measured by IR reflection-absorbance in NGIA (near grazing incidence angle) are given. It is found that the film has V2O5 and VO2 combined structures. The films exhibit clear changes in transmittance when the environment temperature (Te) is varied, especially in the 3600-4000 cm-1 range. Applying a Te that is higher than a critical temperature (Tc) to the samples, the as-RT (room temperature) deposited film with 9% PO2 has a transmittance variation of 30%, but the films that were deposited on a heated substrate of 400 deg. C have little variation. There is tendency of bigger variation in transmittance for the sample deposited at a larger PO2, when it is applied by 200 deg. C Te
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2007.03.131Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2007.03.131;
- PII
- S0040-6090(07)00407-5;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 516
- Journal Issue
- 7
- Journal Page Range
- p. 1484-1488
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- Symposium R on advances in transparent electronics - From materials to devices
- Acronym
- EMRS 2006
- Dates
- 29 May - 2 Jun 2006
- Place
- Nice (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39071408
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; CRITICAL TEMPERATURE; ELECTROCHROMISM; FILMS; MAGNETRONS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; VANADIUM OXIDES; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRO-OPTICAL EFFECTS; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; TEMPERATURE RANGE; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENT COMPOUNDS; TRANSITION TEMPERATURE; VANADIUM COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.