Published August 4, 2017 | Version v1
Journal article

Fine-tunable plasma nano-machining for fabrication of 3D hollow nanostructures: SERS application

  • 1. Laser and Plasma Research Institute, Shahid Beheshti University, G. C., Evin, Tehran, 19839 (Iran, Islamic Republic of)
  • 2. MEMS and NEMS Lab, Department of Electronic and Computer Engineering, Tehran University, Tehran (Iran, Islamic Republic of)
  • 3. Department of Physics, Shahid Beheshti University, G. C., Evin, Tehran, 19839 (Iran, Islamic Republic of)

Description

Novel processing sequences for the fabrication of artificial nanostructures are in high demand for various applications. In this paper, we report on a fine-tunable nano-machining technique for the fabrication of 3D hollow nanostructures. This technique originates from redeposition effects occurring during Ar dry etching of nano-patterns. Different geometries of honeycomb, double ring, nanotube, cone and crescent arrays have been successfully fabricated from various metals such as Au, Ag, Pt and Ti. The geometrical parameters of the 3D hollow nanostructures can be straightforwardly controlled by tuning the discharge plasma pressure and power. The structure and morphology of nanostructures are probed using atomic force microscopy (AFM), scanning electron microscopy (SEM), optical emission spectroscopy (OES) and energy dispersive x-ray spectroscopy (EDS). Finally, a Ag nanotube array was assayed for application in surface enhanced Raman spectroscopy (SERS), resulting in an enhancement factor (EF) of 5.5 × 105, as an experimental validity proof consistent with the presented simulation framework. Furthermore, it was found that the theoretical EF value for the honeycomb array is in the order of 107, a hundred times greater than that found in nanotube array. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6528/aa78e9

Additional details

Identifiers

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
28
Journal Issue
31
Journal Page Range
[14 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
50042990
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; COMPUTERIZED SIMULATION; EMISSION SPECTROSCOPY; NANOTUBES; PROBES; PROCESSING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACES; X-RAY SPECTROSCOPY
Descriptors DEC
ELECTRON MICROSCOPY; LASER SPECTROSCOPY; MICROSCOPY; NANOSTRUCTURES; SIMULATION; SPECTROSCOPY