Published June 1, 2011 | Version v1
Journal article

Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions

  • 1. Physics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831-6372 (United States)
  • 2. Max-Planck-Institut fuer Plasmaphysik, EURATOM Association, Boltzmannstr. 2, 85748 Garching (Germany)

Description

We have experimentally determined total carbon yields per incident H atom in the energy range 36-300 eV/H for H+, H2+, and H3+ projectiles incident normally on ∼60 nm thick a-C:H films, using 2-D ellipsometry determination of erosion crater volumes ex vacuo, the separately characterized thin film carbon density, and the incident beam current integration accumulated on target during the crater evolution. During each beam exposure, methane production was monitored using in situ quadrupole mass spectrometry (QMS). The present total carbon yields/H for incident H3+ ions obtained via ellipsometry are in agreement with total mass loss measurements for H3+ by Balden and Roth over the investigated energy range. The observed methane production per incident H for the molecular ions exhibits molecular size effects over the entire energy range investigated, confirming the trend observed in the ellipsometry-based total C yields/H.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2010.12.071

Additional details

Identifiers

DOI
10.1016/j.nimb.2010.12.071;
PII
S0168-583X(10)01004-9;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
269
Journal Issue
11
Journal Page Range
p. 1276-1279
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
18. international workshop on inelastic ion-surface collisions
Acronym
IISC-18
Dates
26 Sep - 1 Oct 2010
Place
Gatlinburg, TN (United States)

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.