Published December 1989 | Version v1
Journal article

On the nature of radiation-induced defects in n-type silicon irradiated by electrons of energies near the threshold of defect formation

  • 1. AN SSSR, Leningrad (USSR). Fiziko-Tekhnicheskij Inst.

Description

Radiation-induced defects(RD), which are formed in n-base of silicon diodes, irradiated by 270 and 300 keV energy electrons, are investigated. The following complexes were determined by DLTS technique: vacancy-oxygen (A-center), oxygen-carbon-vacancy (K-center) and interstitial-node carbon. These RD and those, formed at silicon irradiation by 1 MeV energy electrons, are identical

Additional details

Additional titles

Original title (Russian)
О природе радиационных дефектов в н-кремнии, облученном электронами с энергией вблизи порога дефектообразования

Publishing Information

Journal Title
Fizika i Tekhnika Poluprovodnikov
Journal Volume
23
Journal Issue
12
Series
Fiz. Tekh. Poluprovodn.
Journal Page Range
2129-2132
ISSN
0015-3222
CODEN
FTPPA