Published October 1, 2013 | Version v1
Journal article

Enhanced Low Dose Rate Sensitivity (ELDRS) tests on advanced SiGe bipolar transistors for very high total dose applications

  • 1. Centro Nacional de Microelectrónica (CNM-CSIC), Barcelona (Spain)
  • 2. Santa Cruz Institute for Particle Physics (SCIPP), University of California Santa Cruz, Santa Cruz, CA (United States)
  • 3. Lawrence Berkeley National Laboratory (LBNL), Physics Division, Berkeley, CA (United States)
  • 4. Brookhaven National Laboratory (BNL), Upton, NY (United States)
  • 5. University of Pennsylvania, Philadelphia, PA (United States)

Description

A new comprehensive method for assessing Enhanced Low Dose Rate Sensitivity (ELDRS) in bipolar transistors to be used for very high total doses is applied to an advanced SiGe HBT technology for its use in the ATLAS Upgrade at CERN. Conventional ELDRS assessment methods are combined with switched experiments (high/low dose rate), providing a way to verify the presence of ELDRS at very high doses in reasonable irradiation time. Additionally, an anomalous damage recovery has been found in transistors with saturated damage after further low dose rate irradiations. -- Highlights: • It has been demonstrated that the bipolar technology under study does not show ELDRS in the whole range of total doses studied. • The previous radiation hardness tests of a SiGe HBT technology have been validated. • A new ELDRS test strategy is presented for ELDRS in very high total dose applications. • An anomalous damage recovery has been observed in switched dose rate experiments in the saturation region

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nima.2013.04.088

Additional details

Identifiers

DOI
10.1016/j.nima.2013.04.088;
PII
S0168-9002(13)00550-0;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Journal Volume
724
Journal Page Range
p. 41-46
ISSN
0168-9002
CODEN
NIMAER

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.