Published November 12, 1976
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Low-frequency electric-microfield distributions in a plasma containing multiply-charged ions: extended calculations
Description
The formalism needed for the computation of electric microfield distributions in plasmas is extended as follows: (1) the perturbing ions and electrons in the plasma are allowed to have different kinetic temperatures; (2) two species of perturbing ions, of charge z1 and z2, may be present in any given proportion. Computed results are presented graphically for parameter ranges which are of interest in the study of laser-produced plasmas
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS., PC A02/MF A01 as DE82015634.
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Additional details
Publishing Information
- Imprint Pagination
- 23 p.
- Report number
- DOE/DP/40016--T1
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 14721849
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ANALYTICAL SOLUTION; ELECTRIC FIELDS; ION DENSITY; KINETIC EQUATIONS; LASER-PRODUCED PLASMA; PLASMA
- Descriptors DEC
- EQUATIONS