Optical in situ sputter rate measurements during ion sputtering

A laser optical technique is applied to secondary ion mass spectrometry/Auger electron spectroscopy for in situ sputter rate measurements. Phases and reflectances as measured during sputtering of opaque and transparent material give reliable results yielding the sputter rate interface position and interface region width. For opaque material there is a simple linear relation between the phase and the sputter rate. In the case of transparent material the sputter rate is determined from the phase or reflectance by using a more complex calculation. (author)