Published June 5, 2006
| Version v1
Journal article
Diminished Shockley-Read-Hall recombination in near-surface pseudomorphic Si1-xGe x/Si double quantum wells
Creators
- 1. PRESTO, Japan Science and Technology Agency (JST), Kawaguchi, Saitama 332-0012 (Japan) and Graduate School of Arts and Sciences, University of Tokyo, 3-8-1 Komaba, Meguro, Tokyo 153-8902 (Japan)
- 2. Graduate School of Arts and Sciences, University of Tokyo, 3-8-1 Komaba, Meguro, Tokyo 153-8902 (Japan)
- 3. PRESTO, Japan Science and Technology Agency (JST), Kawaguchi, Saitama 332-0012 (Japan)
Description
The unique type-II potential lineup of pseudomorphic Si1-xGe x/Si quantum wells (QWs) allows a negative charge buildup in the near-surface region. As a result, diminished Shockley-Read-Hall (SRH) recombination is observed in the surface-side QW in a double QW geometry where charge imbalance due to the negative charge buildup plays a critical role. Spectral changes due to the charge redistribution under longitudinal electric fields indicate that the second QW on the substrate-side is key to the charge imbalance, and allows an enhanced internal quantum efficiency of radiative recombination in the surface-side QW
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2005.09.199;
- PII
- S0040-6090(05)02019-5;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 508
- Journal Issue
- 1-2
- Journal Page Range
- p. 414-417
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 4. international conference on silicon epitaxy and heterostructures
- Acronym
- ICSI-4
- Dates
- 23-26 May 2005
- Place
- Awaji Island, Hyogo (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38004743
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRIC FIELDS; GERMANIUM SILICIDES; QUANTUM EFFICIENCY; QUANTUM WELLS; RECOMBINATION; SURFACES
- Descriptors DEC
- EFFICIENCY; GERMANIUM COMPOUNDS; NANOSTRUCTURES; SILICIDES; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.