Published July 2013
| Version v1
Journal article
Effect of magnetic field profile on the uniformity of a distributed electron cyclotron resonance plasma
- 1. Department of Mechanical Engineering, National Taiwan University, Taipei, Taiwan (China)
- 2. Department of Physics, National Tsing Hua University, Hsinchu, Taiwan (China)
- 3. Chung-Shan Institute of Science and Technology, Lung-Tan, Taoyuan, Taiwan (China)
Description
This study extensively measured the uniformity of an electron cyclotron resonance (ECR) plasma versus the magnetic field distribution. The influence of magnetic field distribution on the generation of uniform ECR plasma was examined. It is suggested that in addition to the uniformity of the magnetic field distribution at ECR zone and at the downstream zone near the substrate, the transition of the magnetic field between these two zones is also crucial. A uniform ECR plasma with the electron density uniformity of ±7.7% over 500 × 500 mm2 was measured at the downstream. The idea of generating uniform ECR plasma can be scaled up to a much larger area by using an n × n microwave input array and a well-designed magnetic system
Additional details
Identifiers
- DOI
- 10.1063/1.4813788;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 20
- Journal Issue
- 7
- Journal Page Range
- p. 073504-073504.4
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45049069
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ECR HEATING; ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; MAGNETIC FIELD CONFIGURATIONS; MAGNETIC FIELDS; MICROWAVE RADIATION; PLASMA DENSITY; RF SYSTEMS; SUBSTRATES
- Descriptors DEC
- CYCLOTRON RESONANCE; ELECTROMAGNETIC RADIATION; HEATING; HIGH-FREQUENCY HEATING; PLASMA HEATING; RADIATIONS; RESONANCE
Optional Information
- Notes
- (c) 2013 AIP Publishing LLC