Design of characteristic parameters for controlling tungsten tip profile during electrochemical etching

Micro/nano-scale tungsten tips fabricated by electrochemical etching have many diverse industrial applications. The characteristic parameters of the tungsten tip profile include apex radius, taper angle, and aspect ratio. These parameters are governed by many factors including applied voltage, concentration of the electrolyte (potassium hydroxide) solution, and diameter of the inner gold ring. However, a systematic investigation with the aim of determining the best conditions for fabricating micro/nano-scale tips with desired profiles has not been carried out yet. This study is aimed at obtaining controllable tungsten tip -particularly with respect to the radius of curvature and aspect ratio of tips (taper angle)-by altering the experimental conditions. A series of experiments were executed and the results were aggregated and analyzed using response surface methodology in order to identify the relationships between the tungsten tip characteristics and input parameters. The method proposed herein would prove to be suitable for a variety of applications in industries that require tungsten tips with a specific profile