Published March 1974
| Version v1
Journal article
Photosensitive protecting groups - a review
Creators
- 1. Weizmann Inst. of Science, Rehovoth (Israel). Dept. of Organic Chemistry
Description
Abstract A review of recent work utilizing photosensitive protecting groups is presented, (literature to September 1973 is reviewed). Although still in the developmental stage, the application of groups such as 2‐nitrobenzyl, 3‐nitrophenyl, 3,5‐dimethoxybenzyl, 2,4‐dinitrobenzenesulfenyl and 3,5‐dimethoxybenzoinyl in synthetic chemistry shows great promise for the future.
Additional details
Identifiers
Publishing Information
- Journal Title
- Israel Journal of Chemistry
- Journal Volume
- 12
- Journal Issue
- 1-2
- Series
- Isr. J. Chem. ;Arieh Berger Memorial Issue.
- Journal Page Range
- 103-113
- ISSN
- 0021-2148
INIS
- Country of Publication
- Israel
- Country of Input or Organization
- Israel
- INIS RN
- 6180046
- Subject category
- S38: RADIATION CHEMISTRY, RADIOCHEMISTRY AND NUCLEAR CHEMISTRY;
- Descriptors DEI
- BENZYL RADICALS; NITRO COMPOUNDS; PHOTOCHEMISTRY
- Descriptors DEC
- ARYL RADICALS; CHEMISTRY; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS; RADICALS
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent