Photosensitive PZT gel films and their preparation for fine patterning

A novel technique has been developed to lithographically make fine patterns on PZT films. Employing chemical modification in acetylacetone (AcAc), we have obtained an UV photosensitive PZT sol from which the PZT films to be patterned can be prepared. With methanol as solvent and AcAc as chemical modifier, three sols used to compose the PZT coating sol are obtained from Zirconium oxynitrate (ZrO(NO3)2), lead acetate (Pb(CH3COO)2), and tetrabutyl titanate ((C4H9O)4Ti), respectively. By means of UV-vis and FT-IR spectrophotometers we have found that AcAc can associate with Zr, Pb, and Ti ions to form three chelate complexes, the UV absorption peaks of which are located at wavelength 304, 315 and 329 nm, respectively. However, the photosensitive PZT coating sol has UV absorption peak at around 312 nm. Both the chelate complexes in sol and the UV absorption peak can be remained in the gel films. When the photosensitive PZT gel film is irradiated by UV light containing 312 nm wavelength, its solubility in solvents such as alcohol, acetone and so on is reduced remarkably, while the UV absorption peak disappears with the dissociation of the chelate complexes correspondingly. Utilizing the characteristics, a fine pattern can be obtained by irradiation of UV light on the PZT gel film through a pattern mask and dissolving the non-irradiated area in suitable solvent. After annealing at 680 deg. C for 30 min, the PZT films with specific fine pattern can be obtained