Published March 2009
| Version v1
Journal article
Dislocation mobility study of heavy ion induced track damage in LiF crystals
- 1. ISSP, University of Latvia, 8 Kengaraga Str., LV 1063, Riga (Latvia)
- 2. CIMAP-GANIL, Caen, Bd H. Becquerel, BP 5133 14070 CAEN-cedex 05 (France)
- 3. GSI Darmstadt, Planckstrasse 1, D-64219 Darmstadt (Germany)
Description
The track damage created in LiF crystals by swift U, Xe and Kr ions with a specific energy of 11.1 MeV/u was studied using dislocation mobility measurements, track etching, SEM, AFM and optical microscopy. The results demonstrate high sensitivity of dislocation mobility to track core damage. The relationship between the energy loss of ions, dislocation mobility and track structure is discussed.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.nimb.2009.02.019Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2009.02.019;
- PII
- S0168-583X(09)00235-3;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 267
- Journal Issue
- 6
- Journal Page Range
- p. 949-952
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 7. international symposium on swift heavy ions in matter
- Dates
- 2-5 Jun 2008
- Place
- Lyon (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41027643
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; CRYSTALS; DAMAGE; DISLOCATIONS; ENERGY LOSSES; ETCHING; HEAVY IONS; KRYPTON IONS; LITHIUM FLUORIDES; MEV RANGE 10-100; MOBILITY; OPTICAL MICROSCOPY; PARTICLE TRACKS; SCANNING ELECTRON MICROSCOPY; SENSITIVITY
- Descriptors DEC
- ALKALI METAL COMPOUNDS; CHARGED PARTICLES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELECTRON MICROSCOPY; ENERGY RANGE; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; IONS; LINE DEFECTS; LITHIUM COMPOUNDS; LITHIUM HALIDES; LOSSES; MEV RANGE; MICROSCOPY; SURFACE FINISHING
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.