Published December 30, 2011
| Version v1
Journal article
Multiple surface plasmon waves in [prism/Ag/SiO2 helical thin film] Kretschmann configuration
- 1. Department of Physics, Inha University, Incheon 402-751 (Korea, Republic of)
- 2. Key Lab of Radiation Physics and Technology of Education Ministry of China, Institute of Nuclear Science and Technology, Sichuan University, Chengdu, Sichuan, 610064 (China)
Description
Two surface plasmon resonance dips in reflectance angular spectrum for a p-polarized incident beam of a [prism/Ag/SiO2 helical thin film] Kretschmann configuration are measured and compared with simulations. The simulation also shows that the angular positions of resonances due to surface plasmon waves in reflectance spectrum are sensitive to the variation of principal refractive indices of helical films. It indicates that multiple surface plasmon waves at the [Ag/SiO2 helical thin film] interface is more attractive than the traditional method of producing only one surface plasmon wave for chemical- and bio-sensing applications.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2011.10.001Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2011.10.001;
- PII
- S0040-6090(11)01733-0;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 520
- Journal Issue
- 5
- Journal Page Range
- p. 1451-1453
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 38. international conference on metallurgical coatings and thin films
- Acronym
- ICMCTF 2011
- Dates
- 27 Apr - 2 May 2011
- Place
- San Diego, CA (United States)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43108590
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ACCIDENTS; CONFIGURATION; DEPOSITION; INTERFACES; PRISMS; REFRACTIVE INDEX; RESONANCE; SILICA; SILICON OXIDES; SIMULATION; SPECTRA; SURFACES; THIN FILMS
- Descriptors DEC
- CHALCOGENIDES; FILMS; MINERALS; OPTICAL PROPERTIES; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.