Published 1973
| Version v1
Conference paper
Trace analysis using ion abrasion techniques and nuclear reactions
Creators
- 1. CEA Centre d'Etudes Nucleaires de Grenoble, 38 (France). Dept. de Recherche Fondamentale
Description
no abstract available
Additional details
Additional titles
- Original title (French)
- Analyse de traces par utilisation simultanee d'un abraseur ionique et des techniques de reactions nucleaires
Publishing Information
- Publisher
- Centre d'Etudes Nucleaires. Laboratoire d'Electronique et de Technologie de l'Informatique.
- Imprint Place
- Grenoble, France
- Imprint Title
- Proceedings of the colloquium on the characterization of semiconductor materials and technologies
- Imprint Pagination
- p. 305-314.
Conference
- Title
- Colloquium on the physicochemical and electrical properties of semiconductor materials and the manufacturing processes for these materials.
- Dates
- 27 Sep 1972.
- Place
- Grenoble, France.
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 5132394
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABRASION; BORON; DEPTH; ION BEAMS; NUCLEAR REACTION ANALYSIS; PHOSPHORUS; SILICON; SPUTTERING; SURFACES
- Descriptors DEC
- BEAMS; CHEMICAL ANALYSIS; DIMENSIONS; ELEMENTS; NONMETALS; SEMIMETALS
Optional Information
- Notes
- Imprint:Comptes rendus du colloque caracterisation des materiaux et technologies des semiconducteurs.