Published April 9, 2020 | Version v1
Journal article

Low consumption two-terminal artificial synapse based on transfer-free single-crystal MoS2 memristor

  • 1. School of Electrical and Electronic Engineering, Tianjin Key Laboratory of Film Electronic and Communication Devices, Tianjin University of Technology, Tianjin 300384 (China)
  • 2. School of Electronic Science & Engineering and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093 (China)

Description

Both synaptic emulators and brain-like calculation demand an energy-efficient and bio-realistic device where two-dimensional materials have been proven as a promising competitor. Lateral memristors based on transfer-free single-crystal MoS2 with single layer grown by chemical vapor deposition (CVD) were fabricated. Here the MoS2 memristor successfully emulates typical biological synaptic behaviors including excitatory/inhibitory post-synaptic current (EPSC/IPSC), spike timing-dependent plasticity (STDP), spike rate-dependent plasticity (SRDP) and long-term plasticity (LTP). Moreover, an interesting multi-state LTP and a low consumption of 1.8 pJ after LTP process are achieved which is attributed to the high resistance of transfer-free single-crystal monolayer MoS2, representing a low value among previous MoS2 devices. The migration of Sulfur vacancies lead the conductance modulation by changing the Schottky barrier instead of forming a filament. Our work demonstrates that MoS2 memristors can more flexibly satisfy the demands of complex artificial synaptic/neuron applications. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6528/ab82d6

Additional details

Identifiers

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
31
Journal Issue
26
Journal Page Range
[10 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
53031283
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; EQUIPMENT; LAYERS; MOLYBDENUM SULFIDES; MONOCRYSTALS; PLASTICITY
Descriptors DEC
CHALCOGENIDES; CHEMICAL COATING; CRYSTALS; DEPOSITION; MECHANICAL PROPERTIES; MOLYBDENUM COMPOUNDS; REFRACTORY METAL COMPOUNDS; SULFIDES; SULFUR COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS