Striped domains in soft magnetic FeNiN thin films

FeNiN thin films with good soft magnetic properties were synthesized on Si (1 0 0) substrates at 473 K by RF magnetron sputtering; all the films have a thickness of around 500 nm. The dependence of phase structure and magnetic properties on nickel concentrations and RF power were systematically investigated. With increasing nickel contents from XNi = 5.0% to XNi 65.5%, FeNiN thin films deposited at Pn2=10.0 % turn from a main bcc α-(Fe,Ni) phase coexisting with γ'-phase to fcc γ-(FeNi3)4N phase. With the RF power larger than 160 W, the samples deposited at PN2=3% all show clear reproducible striped domains at the films' surfaces, which is explained by the high enough perpendicular anisotropy and the small stress in the film. A completely ordered structure of (FeNi)N0.0324-phase forms at PW = 300 W. The FeNiN thin films prepared at different RF power show smooth surfaces and good soft magnetic properties compared with corresponding FeN compounds. The optimum soft magnetic properties with MS of ∼ 1900 emu cm-3, HC of ∼1 Oe are obtained at PN2=3% and PW = 300 W at 473 K