Epitaxial LaFeAsO1-xFx thin films grown by pulsed laser deposition
- 1. IFW Dresden, Institute for Metallic Materials, PO Box 270116, D-01171 Dresden (Germany)
Description
Superconducting and epitaxially grown LaFeAsO1-xFx thin films were successfully prepared on (001)-oriented LaAlO3 substrates using pulsed laser deposition. The prepared thin films show exclusively a single in-plane orientation with the epitaxial relation (001)[100]||(001)[100] and a full width at half-maximum value of 10. Furthermore, resistive measurement of the superconducting transition temperature revealed a Tc,90% of 25 K with a high residual resistive ratio of 6.8. The preparation technique applied, standard thin film pulsed laser deposition at room temperature in combination with a subsequent post-annealing process, is suitable for fabrication of high quality LaFeAsO1-xFx thin films. A high upper critical field of 76.2 T was evaluated for magnetic fields applied perpendicular to the c-axis and the anisotropy was calculated to be 3.3 assuming single band superconductivity. (rapid communication)
Availability note (English)
Available from http://dx.doi.org/10.1088/0953-2048/23/2/022002Additional details
Identifiers
- DOI
- 10.1088/0953-2048/23/2/022002;
- PII
- S0953-2048(10)32064-1;
Publishing Information
- Journal Title
- Superconductor Science and Technology
- Journal Volume
- 23
- Journal Issue
- 2
- Journal Page Range
- [4 p.]
- ISSN
- 0953-2048
- CODEN
- SUSTEF
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42057826
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINATES; ANNEALING; ENERGY BEAM DEPOSITION; EPITAXY; FABRICATION; LASER RADIATION; PULSED IRRADIATION; SUBSTRATES; SUPERCONDUCTING FILMS; SUPERCONDUCTIVITY; THIN FILMS; TRANSITION TEMPERATURE
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CRYSTAL GROWTH METHODS; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; ELECTROMAGNETIC RADIATION; FILMS; HEAT TREATMENTS; IRRADIATION; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SURFACE COATING; THERMODYNAMIC PROPERTIES