Magnetical asymmetry effect in capacitively coupled plasmas: effects of the magnetic field gradient, pressure, and gap length
Creators
- 1. School of Physics, Huazhong University of Science and Technology, Wuhan 430074 (China)
- 2. State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan 430074 (China)
- 3. School of Science, Wuhan University of Technology, Wuhan 430070 (China)
Description
By applying the asymmetric magnetic field to a discharge, the dc self-bias and asymmetric plasma response can be generated even in a geometrically and electrically symmetric system. This is called magnetical asymmetric effect (MAE), which can be a new method to control the ion energy and flux independently (Yang et al 2017 Plasma Process. Polym. 14 1700087). In the present work, the effects of magnetic field gradient, gas pressure and gap length on MAE are investigated by using a one-dimensional implicit particle-in-cell/Monte Carlo collision simulation. It found that by appropriately increasing the magnetic field gradient and the gap length, the range of the self-bias voltage will be enlarged, which can be used as the effective approach to control the ion bombarding energy at the electrodes since the ion energy is determined by the voltage drop across the sheath. It also found that the ion flux asymmetry will disappear at high pressure when the magnetic field gradient is relative low, due to the frequent electron-neutral collisions can disrupt electron gyromotion and thus the MAE is greatly reduced. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6595/aab47eAdditional details
Identifiers
Publishing Information
- Journal Title
- Plasma Sources Science and Technology
- Journal Volume
- 27
- Journal Issue
- 3
- Journal Page Range
- [7 p.]
- ISSN
- 0963-0252
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52042056
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ASYMMETRY; COMPUTERIZED SIMULATION; ELECTRIC POTENTIAL; ELECTRODES; ELECTRONS; IONS; MAGNETIC FIELDS; MONTE CARLO METHOD; ONE-DIMENSIONAL CALCULATIONS; PLASMA; SYMMETRY
- Descriptors DEC
- CALCULATION METHODS; CHARGED PARTICLES; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; SIMULATION