Published March 1, 2018 | Version v1
Journal article

Magnetical asymmetry effect in capacitively coupled plasmas: effects of the magnetic field gradient, pressure, and gap length

  • 1. School of Physics, Huazhong University of Science and Technology, Wuhan 430074 (China)
  • 2. State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan 430074 (China)
  • 3. School of Science, Wuhan University of Technology, Wuhan 430070 (China)

Description

By applying the asymmetric magnetic field to a discharge, the dc self-bias and asymmetric plasma response can be generated even in a geometrically and electrically symmetric system. This is called magnetical asymmetric effect (MAE), which can be a new method to control the ion energy and flux independently (Yang et al 2017 Plasma Process. Polym. 14 1700087). In the present work, the effects of magnetic field gradient, gas pressure and gap length on MAE are investigated by using a one-dimensional implicit particle-in-cell/Monte Carlo collision simulation. It found that by appropriately increasing the magnetic field gradient and the gap length, the range of the self-bias voltage will be enlarged, which can be used as the effective approach to control the ion bombarding energy at the electrodes since the ion energy is determined by the voltage drop across the sheath. It also found that the ion flux asymmetry will disappear at high pressure when the magnetic field gradient is relative low, due to the frequent electron-neutral collisions can disrupt electron gyromotion and thus the MAE is greatly reduced. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6595/aab47e

Additional details

Identifiers

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
27
Journal Issue
3
Journal Page Range
[7 p.]
ISSN
0963-0252

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
52042056
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ASYMMETRY; COMPUTERIZED SIMULATION; ELECTRIC POTENTIAL; ELECTRODES; ELECTRONS; IONS; MAGNETIC FIELDS; MONTE CARLO METHOD; ONE-DIMENSIONAL CALCULATIONS; PLASMA; SYMMETRY
Descriptors DEC
CALCULATION METHODS; CHARGED PARTICLES; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; SIMULATION