Published December 1992 | Version v1
Journal article Metadata-only

Development adjustment and preliminary application of a three-beam synchronously mixed implanter

Creators

  • 1. Southwest Inst. of Physics, Leshan, SC (China)

Description

A three beam synchronously mixed implanter is briefly described. The design and adjustment results of the ion, atom and electron beam sources are given. The results of dynamic mixing adjustment of the three beams are presented and preliminary development and applications of the dynamic mixed ion implantation process are introduced as well. Three-beam synchronous treatment and activation by electron beam are the main features of this device

Additional details

Publishing Information

Journal Title
Nuclear Fusion and Plasma Physics
Journal Volume
12
Journal Issue
4
Journal Page Range
p. 238-244, 251.
ISSN
0254-6086
CODEN
HYDWDP

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
25028652
Subject category
S43: PARTICLE ACCELERATORS;
Descriptors DEI
ATOMIC BEAM SOURCES; ELECTRON GUNS; ION IMPLANTATION; ION SOURCES; KEV RANGE 10-100; MILLI AMP BEAM CURRENTS; PARTICLE SOURCES; PERFORMANCE TESTING; SURFACE HARDENING
Descriptors DEC
BEAM CURRENTS; CURRENTS; ENERGY RANGE; HARDENING; KEV RANGE; NEUTRAL BEAM SOURCES; RADIATION SOURCES; SURFACE TREATMENTS; TESTING