Crystalline structure of heteroepitaxial GaAs and GaAsP layers grown on GaAs substrates investigated by X-ray diffraction. 2. Strain in GaAsP layer
- 1. Daido Inst. of Technology, Dept. of Electrical and Electronic Engineering, Nagoya, Aichi (Japan)
- 2. Daido Steel Co. Ltd., New Business Development Center, Nagoya, Aichi (JP)
- 3. Osaka Prefecture Univ., Faculty of Engineering, Sakai, Osaka (JP)
Description
Following our previous paper, the crystalline structure of GaAs/GaAsP layers, used for spin-polarized electron sources, was investigated by X-ray diffraction. From the observation of reciprocal maps of the {113} reflections under the condition of a small glancing angle with a narrow receiving slit, the strain remaining in the GaAsP layer was revealed. The strain remained only along the [1-bar10] direction; however, strain in a long range was almost released along the [1-bar1-bar0] direction. It was also shown that the specimen was divided into four large blocks, with their boundaries being parallel to the [1-bar1-bar0] and [1-bar10] directions. At the boundary parallel to the [1-bar1-bar0] direction, the {113} lattice plane was distorted. (author)
Additional details
Publishing Information
- Journal Title
- Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications and Review Papers
- Journal Volume
- 46
- Journal Issue
- 2
- Journal Page Range
- p. 509-513
- ISSN
- 0021-4922
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 38062300
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BRAGG REFLECTION; CRYSTAL STRUCTURE; GALLIUM ARSENIDES; LAYERS; MEASURING METHODS; PHOSPHORUS ADDITIONS; STRAINS; SUBSTRATES; TOPOGRAPHY; VAPOR PHASE EPITAXY; X-RAY DIFFRACTION
- Descriptors DEC
- ALLOYS; ARSENIC COMPOUNDS; ARSENIDES; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DIFFRACTION; EPITAXY; GALLIUM COMPOUNDS; PNICTIDES; REFLECTION; SCATTERING
Optional Information
- Notes
- 3 refs., 11 figs.