Published May 1, 2008 | Version v1
Journal article

Using OES to determine electron temperature and density in low-pressure nitrogen and argon plasmas

  • 1. Department of Engineering Physics, Tsinghua University, Beijing 100084 (China)

Description

A summary of the methods of electron temperature and electron density measurement in low-pressure nitrogen and argon discharges using optical emission spectroscopy (OES) is given. This paper describes recently developed simple kinetic models for nitrogen and argon discharges and their applications in establishing the relationship between the electron parameters (temperature and density) and the OES line ratios from the discharges. In particular, the assumptions and applicability of these models in different kinds of discharges (capacitively coupled and inductively coupled discharges, discharges with different gas mixtures, etc) are discussed in detail.

Availability note (English)

Available from http://dx.doi.org/10.1088/0963-0252/17/2/024002

Additional details

Identifiers

DOI
10.1088/0963-0252/17/2/024002;
PII
S0963-0252(08)60314-X;

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
17
Journal Issue
2
Journal Page Range
[6 p.]
ISSN
0963-0252

Conference

Title
28. international conference on phenomena in ionized gases
Acronym
ICPIG
Dates
15-20 Jul 2007
Place
Prague (Czech Republic)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41034584
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ARGON; ELECTRON DENSITY; ELECTRON TEMPERATURE; EMISSION SPECTROSCOPY; NITROGEN; PLASMA
Descriptors DEC
ELEMENTS; FLUIDS; GASES; NONMETALS; RARE GASES; SPECTROSCOPY